Super critical rinser & dryer
LB film deposition apparatus
Sample preparation room
Inductively coupled plasma – Reactive ion etching device
Nano-imprinter
Sputtering system
EB deposition system
Deposition system for organic materials
Compact etching system
EB lithography
Ion deposition
Maskless lithography
Compact sputtering
FTIR & polarized microspectroscopy system
Raman & fluorescence microscope
UV-VIS-NIR spectrophotometer
Atomic force microscope
Scanning electron microscope
Joint-type air spring vibration isolation system
Confocal laser scanning microscope
Air spring vibration isolation system
Compact Scanning Electron Microscope
Optical parametric oscillator & femtosecond pulsed laser system
High energy regenerative amplifier & femtosecond pulsed laser system
Femtosecond pulsed laser & optical parametric amplifier
Wavelength sweep femtosecond pulsed laser
Femtosecond ultrashort pulsed laser
Femtosecond pulsed laser
Femtosecond pulsed fiber laser
High repetition rate femtosecond pulsed laser
Quantum cascade laser
Grid computers
Stand-alone computers
2-1 Hirosawa, Wako, Saitama 351-0198, JAPAN Email contact [at]mets.riken.jp